Synthesis of amorphous carbon nanowalls by DC-PECVD on different substrates and study of its field emission properties |
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Authors: | D. BanerjeeS. Mukherjee K.K. Chattopadhyay |
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Affiliation: | a Thin Film & Nanoscience Laboratory, Department of Physics, Jadavpur University, Kolkata 700 032, India b School of Materials Science and Nanotechnology, Jadavpur University, Kolkata 700 032, India |
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Abstract: | Amorphous carbon thin films with quasi vertical nanowall-like morphologies have been synthesized via direct current plasma enhanced chemical vapor deposition on both copper and silicon substrates with acetylene as a carbon precursor. The deposition temperature and pressure were maintained at 750 °C and 5 mbar respectively. The morphology of the as-prepared samples has been investigated with the help of a field emission scanning electron microscope and an atomic force microscope, both revealing nanowall-like morphologies with thicknesses of the walls ∼6-15 nm. The as-prepared carbon nanowalls showed good field electron emission with a turn-on field as low as 1.39 V/μm. The effect of inter-electrode distance on the field electron emission has also been studied in detail. |
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Keywords: | Carbon nanowall PECVD FESEM Field emission |
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