Epitaxial growth of PbTiO3 thin film on (110) NdGaO3 substrate by metalorganic chemical vapor deposition

(001) preferentially oriented PbTiO₃ thin films have been grown on (110) NdGaO₃ substrates by metalorganic chemical vapor deposition (MOCVD) under reduced pressure at 650°C. Atomic force microscopy (AFM) surface morphology of the as-deposited film showed the evidence of layer-by-layer growth in the MOCVD process. By using a grazing-angle scattering technique, a highly resolved Raman spectrum of the epitaxial PbTiO₃thin film on perovskite substrate was first time recorded. Other microstructure of the film, such as the element composition, the c-domain percentage and the epitaxial nature, were investigated by Rutherford backscattering spectrometry (RBS), x-ray θ ? 2θ diffraction patterns and x-ray φ scans, respectively. All measurements indicate that NdGaO₃single crystal, which used to be a substrate for the growth of high-T_c superconducting thin films, is also suitable for the growth of high quality PbTiO₃ thin film. This indicates the promising use of the NdGaO₃ for the integration of ferroelectric thin films and superconducting electrodes.