Preparation and investigation of amorphous silicon thin films and p-i-n structures on their base

A laboratory setup for fabrication of amorphous silicon thin films and structures on their basis by chemical vapor deposition (CVD) has been developed and assembled. All the operating processes were automated by software in LabVIEW media. Special programs and subprograms were created to maintain the corresponding temperature with a necessary accuracy, to control the gas flow controller, as well as to control the vacuum valves. Hydrogenated amorphous silicon thin films of n-, p- and i-types, as well as a test p-i-n structures with different thicknesses were made. Transmission and photoconductivity spectra of the obtained samples were investigated.