Electrodeposition of uranium dioxide films |
| |
| Authors: | L Maya B D Gonzalez M J Lance D E Holcomb |
| |
| Institution: | (1) Chemical Sciences Division, Oak Ridge National Laboratory, 2008-6119, Oak Ridge, TN 37831-6119, USA;(2) Operational Safety Services Division, Oak Ridge National Laboratory, 2008-6119, Oak Ridge, TN 37831-6119, USA;(3) Metals and Ceramics Division, Oak Ridge National Laboratory, 2008-6119, Oak Ridge, TN 37831-6119, USA;(4) Nuclear Science and Technology Division, Oak Ridge National Laboratory, 2008-6119, Oak Ridge, TN 37831-6119, USA |
| |
| Abstract: | Uranium dioxide films in a hydrated form are electrodeposited unto nickel plates starting with a uranyl nitrate solution in
ammonium sulfate. The process is incidental to water splitting which is the dominant electrochemical pathway and as a consequence,
the uranium deposition is highly dependent on experimental parameters that require close control such as the pH and concentration
of the supporting electrolyte as well as current density, and the cell design.
This revised version was published online in July 2006 with corrections to the Cover Date. |
| |
| Keywords: | |
| 本文献已被 SpringerLink 等数据库收录！ |
|
