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Detailed modeling of three-dimensional chemical vapor deposition
Authors:Alexandre Ern  Vincent Giovangigli  Mitchell D Smooke  
Institution:

a CERMICS, ENPC, F-93167, Noisy-le-Grand Cedex, France

b CMAP, CNRS, Ecole Polytechnique, F-91128, Palaiseau Cedex, France

c Department of Mechanical Engineering, Yale University, New Haven, Connecticut 06520-8284, USA

Abstract:
Keywords:Chemical vapor deposition  Gallium arsenide  Carbon doping  Multicomponent transport  Gas-phase chemistry  Surface chemistry
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