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Thickness dependence of the spin- and angle-resolved photoemission of ultrathin,epitaxial Ni(111)/W(110) layers
Authors:K -P Kämper  W Schmitt  D A Wesner  G Güntherodt
Institution:(1) 2. Physikalisches Institut, RWTH Aachen, D-5100 Aachen 1, Fed. Rep. Germany;(2) Present address: Bayer AG, D-4150 Krefeld-Ürdingen, Fed. Rep. Germany
Abstract:The thickness dependence of the magnetic band structure of ultrathin, epitaxial Ni(111)/W(110) layers has been studied by spin and angle-resolved photoemission spectroscopy. The changes of the spin-resolved photoemission intensities upon reducing the layer thickness depend strongly on the wavevector along the Gamma-L line of the Brillouin zone. The measured exchange splittingDelta atk sime1/3(Gamma-L) andk sime1/2(Gamma-L) is found to be independent of the layer thickness for layers consisting of 3 or more atomic layers, whileDelta decreases rapidly with the layer thickness atksime2/3(Gamma-L). This behavior is very similar to the temperature dependence of the spin-resolved photoemission spectra of bulk Ni(111) at the samek-points.
Keywords:75  70Ak  73  60Aq  75  30Pd  79  60Cn
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