Analysis of machining characteristics in electrochemical etching using laser masking |
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| Authors: | Hong Shik Shin Do Kwan Chung Min Soo Park Chong Nam Chu |
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| Institution: | 1. School of Mechanical and Aerospace Engineering, Seoul National University, Gwanak 1 Gwanak-ro, Gwanak-gu, Seoul 151-742, Republic of Korea;2. Department of Product Design and Manufacturing Eng., Seoul National University of Science and Technology, 172 Gongreung 2-dong, Nowon-gu, Seoul 139-743, Republic of Korea |
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| Abstract: | Electrochemical etching using laser masking (EELM), which is a combination of laser beam irradiation for masking and electrochemical etching, allows the micro fabrication of stainless steel without photolithography technology. The EELM process can produce various micro patterns and multilayered structures. In this study, the machining characteristics of EELM were investigated. Changes in characteristics of recast layer formation and the protective effect of the recast layer according to the laser masking conditions and electrochemical etching conditions were investigated by field emission scanning electron microscopy (FE-SEM), focused ion beam (FIB) and X-ray photoelectron spectroscopy (XPS). The oxidized recast layer with a thickness of 500 nm was verified to yield a superior protective effect during electrochemical etching and good form accuracy. Finally, micro patterns and structures were fabricated by EELM. |
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