Inverse pulsed laser deposition |
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Authors: | L Egerhazi Zs Geretovszky T Szorenyi |
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Institution: | (1) Department of Optics and Quantum Electronics, University of Szeged, P.O. Box 406, 6701 Szeged, Hungary;(2) LaserSkill Ltd., Kálvária sugárút 24, 6722 Szeged, Hungary |
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Abstract: | Since the advent of pulsed laser deposition (PLD), several different target-substrate arrangements have been proposed. Besides
the most common on-axis PLD, several off-axis geometries were studied, mainly to protect the substrate from the agglomerated
species (clusters, droplets, particulates) of the plasma plume, which are detrimental to the homogeneity of films. Recently
we introduced a novel geometry, termed inverse pulsed laser deposition (IPLD), in which the substrate is placed parallel to
and slightly above the target plane. In this paper we summarize our results on this new geometry, and show how it can extend
the perspectives of pulsed laser deposition, e.g., by improving the surface morphology of the films. Effects of ambient pressure
are presented and exemplified on metallic and compound IPLD films, including Ti, CN
x
, and Ti-oxides. AFM topographic images are used to prove that under optimized conditions IPLD is capable of growing compact
and smooth films that are superior to PLD ones. A special—but easy-to-implement—IPLD arrangement is also introduced that considerably
improves the homogeneity of IPLD films. In this geometry, the properties (e.g., deposition rate and roughness) of the films
grown in the 1–25 Pa pressure domain are examined. |
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Keywords: | PACS" target="_blank">PACS 81 15 Fg 81 07 -b |
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