| Recent Developments and Applications in Unbalanced Mangnetron Sputtering |
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| 引用本文： | HAN Dakai CHEN Qingchuan. Recent Developments and Applications in Unbalanced Mangnetron Sputtering[J]. 核工业西南物理研究院年报(英文版), 2005, 0(1): 153-155 |
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| 作者姓名： | HAN Dakai CHEN Qingchuan |
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| 摘 要： |
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| 关 键 词： | 喷射磁控管 不均衡磁控管喷射 真空涂层 光学薄膜 |
Recent Developments and Applications in Unbalanced Mangnetron Sputtering |
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| Abstract: | Sputtering deposition is one of the most important processes in the vacuum coating, it is widely used in microeletronics industries, optical films, and metallurgical coatings industry et al. Sputtering deposition is, in the vacuum conditions, sputtered particles from the target material deposit on the substrate using energetic ions to bombard surface of target to form a film. |
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| Keywords: | Sputtering magnetron Sputtering Unbalanced magnetron sputtering |
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