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Thermally activated dissipative conductivity in the fractional quantum Hall effect regime
Authors:S I Dorozhkin  M O Dorokhova  R J Haug  K von Klitzing  K Ploog
Institution:1. Institute of Solid-State Physics, Russian Academy of Sciences, 142432, Chernogolovka, Russia
2. Max-Planck-Institut für Festk?rperforschung, D-7000, Stuttgart 80, Germany
3. Paul-Drude Institut für Festk?rperelektronik, 10117, Berlin, Germany
Abstract:Experimental investigations of thermally activated dissipative conductivity σxx in the fractional quantum Hall effect at filling factors v=1/3 and near zero were performed with GaAs/AlGaAs heterojunction based field-effect transistors with an electronic channel. To within our accuracy of 10%, the pre-exponential factor measured for v=1/3 is equal to 2e*2/h (e*=e/3 is the charge of the quasiparticles), the value expected for the case when the quasielectrons and quasiholes make the same contribution to the conductivity. The observed change in the temperature dependence of the conductivity when n deviates from 1/3 is associated with the change in the filling of the energy levels of the quasielectrons and quasiholes and indicates that there is no gap in the quasiparticle density of states averaged over the sample. Pis’ma Zh. éksp. Teor. Fiz. 63, No. 1, 67–72 (10 January 1996)
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