| 适用于厚膜剥离的图形反转双层胶光刻技术 |
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| 引用本文： | 郭喜,支淑英,杨春莉,巩爽.适用于厚膜剥离的图形反转双层胶光刻技术[J].激光与红外,2010,40(3):257-259. |
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| 作者姓名： | 郭喜 支淑英 杨春莉 巩爽 |
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| 作者单位： | 华北光电技术研究所,北京,100015 |
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| 摘 要： | 介绍了一种适用于厚膜剥离的图形反转双层胶光刻技术,采用图形反转胶和正型光刻胶,选择合适的光刻工艺形成了光刻胶倒梯形的剖面结构,可以成功剥离与胶层厚度相同的膜层,厚度可达13μm。同时对一些技术机理和关键工艺条件进行了讨论。
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| 关 键 词： | 图形反转 双层光刻胶 厚膜剥离 倒梯形 |
Image-reversal dual layer photolithography technology for thick film lift-off |
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| GUO Xi,ZHI Shu-ying,YANG Chun-li,GONG Shuang.Image-reversal dual layer photolithography technology for thick film lift-off[J].Laser & Infrared,2010,40(3):257-259. |
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| Authors: | GUO Xi ZHI Shu-ying YANG Chun-li GONG Shuang |
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| Institution: | North China Research Institute of Electro-optics;Beijing 100015;China |
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| Abstract: | The paper introduced the image-reversal dual layer photolithography technology that is suitable for thick film lift-off.The reverse trapeziform shape of resist was made by coating a image-reversal resist layer on a thicker positive resist layer,this technology can achieve the 13 μm thick film lift-off without high edge.And some mechanism problems are discussed. |
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| Keywords: | image-reversal dual layer resist thick film lift-off reverse trapeziform shape |
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