| 聚焦电子/离子束技术的原理及应用 |
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| 引用本文： | 田吴翟,方靖岳,张学骜.聚焦电子/离子束技术的原理及应用[J].大学物理实验,2013(3):50-54. |
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| 作者姓名： | 田吴翟 方靖岳 张学骜 |
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| 作者单位： | 国防科学技术大学,湖南长沙410073 |
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| 摘 要： | 总结近几年来聚焦电子/离子束双束技术的发展概况和主要应用领域,主要对双束系统的结构、原理及其在刻蚀、沉积、离子注入、显微成像和能谱分析等几方面的应用发展进行介绍,讨论双束技术未来发展的趋势。
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| 关 键 词： | 纳米技术 双束 聚焦离子束 聚焦电子束 诱导沉积 刻蚀 三维成像 光刻 |
The Principle and Application of Focused Electron/Ion Beam Technology |
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| TIAN Wu-di,FANG Jing-yue,ZHANG Xue-ao.The Principle and Application of Focused Electron/Ion Beam Technology[J].Physical Experiment of College,2013(3):50-54. |
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| Authors: | TIAN Wu-di FANG Jing-yue ZHANG Xue-ao |
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| Institution: | (National University of Defense Technology, Hunan Changsha 410072) |
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| Abstract: | With the continuing development of nanotechnology to the breadth and depth, focused electron / ion beam technology has been developed rapidly in recent years. As an important micro-nanofabrication and characterization method,it attracted great attention of the majority of scientists. Thus, the dual-beam technology has been used in more and more applications in the latest research. This paper briefly described the application development, the structure and principle of the dual-beam system. What is more,the main application areas in last few years of the dual-beam technology were summarized,the trend of the future development of dual-beam technology was discussed. |
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| Keywords: | nanotechnology dual-beam focused ion beam focused electron beam induced deposition etching dimensional imaging lithography |
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