Microtopography and field emission properties of carbon films grown in a microwave gas discharge plasma

Graphite-like carbon films are grown in an ethanol vapor plasma in a microwave gas discharge. The electrical parameters controlling the microtopography and electronic properties of carbon films are determined. It is shown that electron bombardment affects the fine structure of graphite-like nanocrystallites and their emissive power with characteristics close to those of carbon nanotubes. The emission properties of layered graphite-like films can be improved by metal (cadmium) impurity doping. For nanocrystalline graphite-like films, emission currents with a density of 0.3 A/cm² are induced at an electric field strength of less than 7 V/µ m in the gap.