Optical damage resistance of Hf:Fe:LiNbO3 crystals with various [Li]/[Nb] ratios

Hf:Fe:LiNbO₃ crystals were grown in air by the Czochralski technique with various [Li]/[Nb] ratios ([Li]/[Nb]=0.94, 1.05, 1.20) in melt. The defect structure and location of doped ions were analyzed by the UV‐visible absorption spectra. The optical damage resistance of Hf:Fe:LiNbO₃ crystals was investigated by the photoinduced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO₃ crystals decreases with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO₃ crystals on the defect structure is discussed in detail. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)