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Si-H, P-H 和 S-H 键离解能Alfa取代基效应研究
引用本文:傅尧,虞堂清,王毅敏,刘磊,郭庆祥. Si-H, P-H 和 S-H 键离解能Alfa取代基效应研究[J]. 中国化学, 2006, 24(3): 299-306. DOI: 10.1002/cjoc.200690057
作者姓名:傅尧  虞堂清  王毅敏  刘磊  郭庆祥
作者单位:Department of Chemistry, University of Science and Technology of China, Hefei, Anhui 230026, China
基金项目:Project supported by the National Natural Science Foundation of China (No. 200332020).
摘    要:CBS-Q and G3 methods were used to generate a large number of reliable Si--H, P---H and S--H bond dissociation energies (BDEs) for the first time. It was found that the Si--H BDE displayed dramatically different substituent effects compared with the C--H BDE. On the other hand, the P---H and S--H BDE exhibited patterns of substituent effects similar to those of the N--H and O--H BDE. Further analysis indicated that increasing the positive charge on Si of XSiH3 would strengthen the Si--H bond whereas increasing the positive charge on P and S of XPH2 and XSH would weaken the P---H and S--H bonds. Meanwhile, increasing the positive charge on Si of XSiH2^+ stabilized the silyl radical whereas increasing the positive charge on P and S in XPH" and XS* destabilized P- and S-centered radicals. These behaviors could be reasonalized by the fact that Si is less electronegative than H while P and S are not. Finally, it was demonstrated that the spin-delocalization effect was valid for the Si-, P- and S-centered radicals.

关 键 词:α-取代作用 键分裂能 甲硅烷自由基 磷基 硫基
收稿时间:2004-08-31
修稿时间:2004-08-312005-11-04

α‐Substituent Effects on Si–H,P–H and S–H Bond Dissociation Energies
Fu Yao;Yu TangQing;Wang YiMin;Liu Lei;Guo QingXiang. α‐Substituent Effects on Si–H,P–H and S–H Bond Dissociation Energies[J]. Chinese Journal of Chemistry, 2006, 24(3): 299-306. DOI: 10.1002/cjoc.200690057
Authors:Fu Yao  Yu TangQing  Wang YiMin  Liu Lei  Guo QingXiang
Abstract:CBS‐Q and G3 methods were used to generate a large number of reliable Si–H, P–H and S–H bond dissociation energies (BDEs) for the first time. It was found that the Si–H BDE displayed dramatically different substituent effects compared with the C–H BDE. On the other hand, the P–H and S–H BDE exhibited patterns of substituent effects similar to those of the N–H and O–H BDE. Further analysis indicated that increasing the positive charge on Si of XSiH3 would strengthen the Si–H bond whereas increasing the positive charge on P and S of XPH2 and XSH would weaken the P–H and S–H bonds. Meanwhile, increasing the positive charge on Si of XSiH2· stabilized the silyl radical whereas increasing the positive charge on P and S in XPH· and XS· destabilized P‐ and S‐centered radicals. These behaviors could be reasonalized by the fact that Si is less electronegative than H while P and S are not. Finally, it was demonstrated that the spin‐delocalization effect was valid for the Si‐, P‐ and S‐centered radicals.
Keywords:substituent effect   bond dissociation energy   silyl radical   phosphorous radical   thiyl radical
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