Direct writing of micro/nano-scale patterns by means of particle lens arrays scanned by a focused diode pumped Nd:YVO4 laser |
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Authors: | Ana Pena Zengbo Wang David Whitehead Lin Li |
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Institution: | (1) Materials Science and Engineering Program/CMBE, Institute of Materials Science, University of Connecticut, Storrs, CT 06269-3136, USA;(2) Nanomaterials Optoelectronics Laboratory, Polymer Program, Institute of Materials Science, University of Connecticut, Storrs, CT 06269-3136, USA; |
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Abstract: | A practical approach to a well-known technique of laser micro/nano-patterning by optical near fields is presented. It is based
on surface patterning by scanning a Gaussian laser beam through a self-assembled monolayer of silica micro-spheres on a single-crystalline
silicon (Si) substrate. So far, the outcome of this kind of near-field patterning has been related to the simultaneous, parallel
surface-structuring of large areas either by top hat or Gaussian laser intensity distributions. We attempt to explore the
possibility of using the same technique in order to produce single, direct writing of features. This could be of advantage
for applications in which only some areas need to be patterned (i.e. local area selective patterning) or single lines are
required (e.g. a particular micro/nano-fluidic channel). A diode pumped Nd:YVO4 laser system (wavelength of 532 nm, pulse duration of 8 ns, repetition rate of 30 kHz) with a computer-controlled 3 axis
galvanometer beam scanner was employed to write user-defined patterns through the particle lens array on the Si substrate.
After laser irradiation, the obtained patterns which are in the micro-scale were composed of sub-micro/micro-holes or bumps.
The micro-pattern resolution depends on the dimension of both the micro-sphere’s diameter and the beam’s spot size. The developed
technique could potentially be employed to fabricate photonic crystal structures mimicking nature’s butterfly wings and anti-reflective
“moth eye” arrays for photovoltaic cells. |
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