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High-photosensitivity p-type ZnTe |
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| Authors: | YT TanRP Khosla JR FischerDK Ranadive |
| Institution: | Research Laboratories, Eastman Kodak Company, Rochester, New York 14650, USA |
| Abstract: | ZnTe with a high photosensitivity has been prepared by annealing single crystals of the material in an atmosphere of Zn and Ga metal and then quenching to room temperature. This material is p-type and exhibits a peak specific sensitivity of about 0.7. |
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