Kondo effect in dilute alloy films of CuFe deposited at room and helium temperature |
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Authors: | K. Knorr C.S. Lim J.D. Leslie |
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Affiliation: | Department of Physics, University of Waterloo, Waterloo, Ontario, Canada |
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Abstract: | The resistivity of Cu, Cu + 100 ppm Fe and Cu + 200 ppm Fe films was measured as a function of temperature from 1 to 300 K. The results on films evaporated at room temperature are compared with contradicting data of other authors. Disordered CuFe alloy films, produced by evaporation onto a substrate at helium temperature, failed to show the theoretically predicted temperature shift of the resistivity minimum. |
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