Photothermal effect contribution on film quality improvement in excimer-laser induced metal CVD |
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| Authors: | H. Yokoyama F. Uesugi S. Kishida K. Washio |
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| Affiliation: | (1) Opto-Electronics Research Laboratories, NEC Corporation, 1-1, Miyazaki 4-chome, Miyamaeku, Kawasaki, 213 Kanagawa, Japan |
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| Abstract: | KrF excimer laser induced Cr film deposition from Cr(CO)6 has been studied. Remarkable film quality dependence on laser intensity suggested the photothermal effect contribution of intensive uv laser pulses in the CVD process. A cw Ar-ion laser light and its second harmonic light were used, to separate photochemical and photothermal effects. As a result, photoinduced surface heating has been found to be very important for obtaining good quality metallic films in KrF laser induced Cr film CVD. |
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| Keywords: | 81.10 68.55 68.20 |
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