Adsorption properties of silica-based sorbents containing phosphonic acid residues |
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| Authors: | G R Yurchenko A K Matkovskii I V Mel’nik O A Dudarko N V Stolyarchuk Yu L Zub B Alonso |
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| Institution: | 1. Chuiko Institute of Surface Chemistry, National Academy of Sciences of Ukraine, ul. Generala Naumova 17, Kyiv, 03164, Ukraine
2. Institut Charles Gerhardt, UMR 5253 (CNRS/ENSCM/UM2/UM1), 48, rue de l??Ecole Normale, 34296, Montpellier, cedex 5, France
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| Abstract: | Isotherms are measured for nitrogen, n-hexane, triethylamine, and water vapor adsorption on silicas of different origins, the surface layers of which contain functional groups of the ??Si(CH2)2P(O)(OH)2 composition, namely, ethylene- and phenylene-bridged polysilsesquioxane xerogels produced by the sol-gel method, silica microspheres synthesized from tetraethoxysilane in the presence of CH3(CH2)17N(CH3)3]Br as a template by spray-drying method, and SBA-15 mesoporous silica produced based on tetraethoxysilane using Pluronic 123 as a template. It is shown that all of the samples possess high specific surface areas, while the types of adsorption isotherms and the accessibility of active acidic sites for adsorption interactions with electron-donor molecules depend on the structures of pores and surface layers, which are governed by the methods of synthesis and postsynthesis sample treatment. |
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