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Ti(Cr)缓冲层对用于垂直磁记录材料CoCrTa介质磁特性和微结构的影响
引用本文:甄聪棉,马丽,张金娟,刘英,聂向富. Ti(Cr)缓冲层对用于垂直磁记录材料CoCrTa介质磁特性和微结构的影响[J]. 物理学报, 2007, 56(3): 1730-1734
作者姓名:甄聪棉  马丽  张金娟  刘英  聂向富
作者单位:河北师范大学物理科学与信息工程学院,石家庄 050016
基金项目:国家自然科学基金;河北师范大学校科研和教改项目;河北省自然科学基金
摘    要:利用直流对靶磁控溅射技术在单晶Si衬底上制备了C/CoCrTa/X (X=Cr,Ti)介质材料.分别采用振动样品磁强计、X射线衍射仪、扫描探针显微镜对样品的磁性、微结构等进行了测试分析.研究发现,Ti缓冲层有利于样品中Co晶粒的易轴垂直于膜面生长.以Ti为缓冲层的样品,颗粒尺寸和表面粗糙度较小,而且磁畴明显,说明以Ti为缓冲层的薄膜样品更适宜做垂直磁记录.关键词:CoCrTa垂直磁记录缓冲层微结构

关 键 词:CoCrTa  垂直磁记录  缓冲层  微结构
文章编号:1000-3290/2007/56(03)/1730-05
收稿时间:2006-08-02
修稿时间:2006-09-01

Effect of Ti(Cr) underlayer on the magnetic properties and microstructure of CoCrTa film for perpendicular magnetic recording media
Zhen Cong-Mian,Ma Li,Zhang Jin-Juan,Liu Ying,Nie Xiang-Fu. Effect of Ti(Cr) underlayer on the magnetic properties and microstructure of CoCrTa film for perpendicular magnetic recording media[J]. Acta Physica Sinica, 2007, 56(3): 1730-1734
Authors:Zhen Cong-Mian  Ma Li  Zhang Jin-Juan  Liu Ying  Nie Xiang-Fu
Affiliation:College of Physics Science and Information Engineering, Hebei Normal University, Shifiazhuang 050016, China
Abstract:C/CoCrTa/X (X=Cr, Ti) films were fabricated with DC facing target magnetron sputtering apparatus. Their magnetic properties and microstructure were characterized by vibrating sample magnetometer (VSM), X-ray diffraction (XRD), and scan probe microscope (SPM), respectively. The experimental results indicate that the Ti underlayer can induce the c-axis orientation of Co grain in the direction perpendicular to the film surface. For samples with Ti underlayer, the grain size and the surface roughness are relatively finer, and magnetic domains can be observed obviously. These results show that the sample with Ti underlayer is more suitable for the perpendicular magnetic recording media.
Keywords:CocrTa
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