首页 | 本学科首页   官方微博 | 高级检索  
     


Analysis of GaN epilayers on sapphire substrates with GaN and AlN sublayers
Authors:Yu. N. Drozdov   M. N. Drozdov   O. I. Khrykin  V. I. Shashkin
Affiliation:1.Institute for Physics of Microstructures,Russian Academy of Sciences,Nizhni Novgorod,Russia
Abstract:The features and results of X-ray diffraction analysis of GaN films are presented. The films are grown by metalorganic vapor-phase epitaxy on c-plane sapphire substrates using GaN or AlN nucleation layers deposited at a low temperature. Measurements of the twist angle and concentrations of Al x Ga1-x N solid solutions are discussed in detail.
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号