Particle-in-Cell/Monte Carlo Collision simulation of planar DC magnetron sputtering

In this paper a numerical simulation of a planar DC magnetrondischarge is performed with the Particle-in-Cell/Monte CarloCollision (PIC/MCC) method. The magnetic field used in thesimulation is calculated with finite element method according toexperimental configuration. The simulation is carried out under thecondition of gas pressure of 0.665,Pa and voltage magnitude of400V. Typical results such as the potential distribution, chargedparticle densities, the discharge current density and ion flux ontothe target are calculated. The erosion profile from the simulationis compared with the experimental data. The maximum erosion positioncorresponds to the place where the magnetic field lines are parallelto the target surface.