An inorganic-organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns via photolithography |
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| Authors: | Nguyen Chi Thanh Hoang Phan Huy Perumal Jayakumar Kim Dong-Pyo |
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| Institution: | National Creative Research Center of Applied Microfluidic Chemistry, Chungnam National University, 220 Kung Dong, Yuseong Gu, Daejeon 305-764, Korea. |
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| Abstract: | A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure. |
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