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Solvent response of polymers for micromachine manipulation
Authors:Tian Ye  Zhang Yong-Lai  Xia Hong  Guo Li  Ku Jin-Feng  He Yan  Zhang Ran  Xu Bin-Zong  Chen Qi-Dai  Sun Hong-Bo
Affiliation:State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China.
Abstract:A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.
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