| 磁控溅射不同厚度铝薄膜的微结构及其表面形貌 |
| |
| 引用本文： | 雷洁红,段浩,邢丕峰,周旭东,杨耀. 磁控溅射不同厚度铝薄膜的微结构及其表面形貌[J]. 半导体光电, 2010, 31(6) |
| |
| 作者姓名： | 雷洁红 段浩 邢丕峰 周旭东 杨耀 |
| |
| 作者单位： | 西华师范大学,物理与电子信息学院,四川,南充,637002;中国工程物理研究院,激光聚变研究中心,四川,绵阳,621900;绵阳师范学院,化学与化工学院,四川,绵阳,621000;中国工程物理研究院,激光聚变研究中心,四川,绵阳,621900;重庆光电技术研究所,重庆,400060 |
| |
| 基金项目： | 国家"863"计划资助项目 |
| |
| 摘 要： | 用直流磁控溅射法在室温的Si(100)基底上制备了21～55 nm范围内不同厚度的铝膜,并用X射线衍射和扫描电镜对薄膜的结构和表面形貌进行了表征.分析结果表明:制备的铝薄膜呈多晶状态,晶粒择优取向为(111),随着膜厚的增加,Al(100)衍射峰宽变窄,薄膜的平均晶粒尺寸逐渐增大,晶面间距逐渐减小,薄膜中的残余应力减小.膜厚为55 nm时,Al膜均匀致密.
|
| 关 键 词： | 直流磁控溅射 铝膜 微结构 表面形貌 |
Microstructure and Surface Morphology of Al Films Prepared by Magnetron Sputtering |
| |
| LEI Jiehong,DUAN Hao,XING Pifeng,ZHOU Xudong,YANGYao. Microstructure and Surface Morphology of Al Films Prepared by Magnetron Sputtering[J]. Semiconductor Optoelectronics, 2010, 31(6) |
| |
| Authors: | LEI Jiehong DUAN Hao XING Pifeng ZHOU Xudong YANGYao |
| |
| Affiliation: | LEI Jiehong1,2,DUAN Hao3,XING Pifeng2,ZHOU Xudong4,YANGYao4(1.Physics and Electronic Information Institute,West China Normal University,Nanchong 637002,CHN,2.Research Center of Laser Fusion,Chinese Academy of Engineering Physics,Mianyang 621900,3.Chemistry and Chemical Engineering College,Mianyang Normal University,Mianyang 621000,4.Chongqing Optoelectronics Research Institute,Chongqing 40060,CHN) |
| |
| Abstract: | Al thin films with different thickness from 21 nm to 55 nm were prepared on Si(100)by DC magnetron sputtering deposition and analyzed by X-ray diffraction and scanning electron microscopy.The analysis shows that the thin films are polycrystalline and preferred orientation of the grain are(111).With the increase of thickness,diffraction peaks of Al(100)become narrow and the mean size of Al particles increases,however,the interplaner spacing and residual stress decreases gradually.When the thickness is 55 nm,... |
| |
| Keywords: | DC magnetron sputtering Al thin films microstructure surface morphology |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
