Effect of pH of aqueous ceramic suspensions on colloidal stability and precision of analytical measurements using slurry nebulization inductively coupled plasma atomic emission spectrometry |
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| Institution: | 1. Department of Inorganic and Analytical Chemistry, L. Eötvös University, P.O. Box 32, H-1518 Budapest 112, Hungary;2. Department of Colloid Chemistry, L. Eötvös University, P.O. Box 32, H-1518 Budapest 112, Hungary;1. Department of Radiology, Stanford University School of Medicine, Stanford, California;2. Hamad Medical Corporation, Doha, Qatar;3. Veterans Affairs Palo Alto Health Care System, Palo Alto, California;1. Key Lab. for New Type of Functional Materials in Hebei Province, School of Materials Science and Engineering, Hebei University of Technology, Tianjin 300130, China;2. China Institute of Atomic Energy, Beijing 102413, China;3. No. 18TH Research Institute, China Electronics Technology Group Corporation, Tianjin 300384, China;1. Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent 700125, Uzbekistan;2. Quantum-Functional Semiconductor Research Center, Dongguk University-Seoul, Seoul 100-715, Republic of Korea;1. Department of Physics and Energy Harvest–Storage Research Center, University of Ulsan, Ulsan 680-749, South Korea;2. Semiconductor Applications, Ulsan College, Ulsan 680-749, South Korea |
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| Abstract: | Colloidal stability of silicon nitride, silicon carbide and boron carbide aqueous slurries used for slurry nebulization inductively coupled plasma atomic emission spectrometry has been investigated in the pH range 2–10 by electrophoretic mobility and particle size measurements, together with sedimentation tests. The mean particle size of silicon nitride and silicon carbide suspensions change with increasing pH showing a maximum at the isoelectric points (pH 7.5 and 5.5 respectively). The particle size distribution of boron carbide slurries remains practically constant and the zeta potential of suspended boron carbide particles shows a small change in the pH range investigated. The silicon nitride and silicon carbide slurries have good stability at pH below 5 and above 8, respectively. Boron carbide slurries show excellent stability in the whole pH range investigated. The time demand for stabilization of the emission line intensities from the start of nebulization strongly depends on the colloidal stability of slurries. Consequently, it is advantageous to nebulize aqueous suspensions with a pH as far from the isoelectric point of the solid as possible and with the ionic strength of the dispersion medium as low as possible. The RSD values of the line intensity measurements determined after 3 min stabilization time decrease with increasing stability of the aqueous slurries. |
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