The role of modifiers in electrothermal vaporization inductively coupled plasma mass spectrometry (ETV-ICP-MS) for the determination of B,La and U |
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| Affiliation: | 1. Department of Chemistry, University of Jyväskylä, P.O. BOX 35, FI-40014, Finland;2. Dept. of Biological and Environmental Science, University of Jyväskylä, P.O. BOX 35, FI-40014, Finland;1. Biological Sciences Division, Oak Ridge, TN 37831, USA;2. Fusion and Materials for Nuclear Systems Division, Oak Ridge, TN 37831, USA;3. Environmental Sciences Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA;4. The University of Tennessee, Center for Renewable Carbon, Knoxville, TN 37996, USA |
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| Abstract: | The role of modifiers in electrothermal vaporization inductively coupled plasma mass spectrometry (ETV-ICP-MS) for the determination of refractory elements such as La or U and carbide forming elements such as B has been studied. Solutions of NH4F, NH4Cl, NH4Br, NaCl, NaF, NH4HSO4, (NH4)2HPO4, the gaseous halogenated hydrocarbons CHF3 and CCl2F2 and HCl have been used as modifiers.The mechanism of the modifier effect and the influence of modifiers on sensitivity enhancement have been investigated. The sensitivity enhancements are great enough to achieve absolute detection limits of 2–6 pg for boron and 10 fg for La and U. The signal reproducibility is 0.5–3.0% for a concentration of 1 μg 1−1 La and U, and 20 μg 1−1 boron. Therefore, by adding modifiers, the use of ETV-ICP-MS can be extended to trace element determination of refractory and carbide forming elements in μl amounts of sample. |
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