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Work function measurements on indium tin oxide films |
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| Authors: | R Schlaf H Murata Z H Kafafi |
| Institution: | a Center for Microelectronics Research, Department of Electrical Engineering, University of South Florida, Tampa, FL 33620, USA b Optical Sciences Division, US Naval Research Laboratory, Washington, DC 20375, USA |
| Abstract: | We determined the work function of indium tin oxide (ITO) films on glass substrates using photoemission spectroscopy (PES). The ITO coated glass substrates were chemically cleaned ex-situ, oxygen plasma treated ex-situ, or sputtered in-situ. Our results suggest that the performance of ultraviolet photoemission spectroscopy (UPS) measurements can induce a significant work function reduction on the order of 0.4–0.5 eV, on ex-situ chemically and oxygen-plasma treated ITO samples. This was demonstrated by the use of low intensity X-ray photoemission spectroscopy (XPS) work function measurements before and after the UPS measurements were carried out. |
| Keywords: | Work function Ultraviolet photoemission spectroscopy (UPS) X-ray photoemission spectroscopy (XPS) Organic light emitting diodes (OLED) |
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