激光增强电沉积铜过程的研究 |
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引用本文: | 王旭红,周焕钧,郁祖湛.激光增强电沉积铜过程的研究[J].化学学报,1993,51(4):341-345. |
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作者姓名: | 王旭红 周焕钧 郁祖湛 |
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作者单位: | 复旦大学化学系,复旦大学化学系,复旦大学化学系 上海 200433,上海 200433,上海 200433 |
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基金项目: | 三束材料改性联合国家重点实验室复旦大学分部的部分资助 |
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摘 要: | 用旋转圆盘电极法研究了激光照射下铜的电沉积过程。证明激光照射引起电极界面微区温度升高, 使平衡电位正移, 交换电流i~o和电荷传递系数α均增大, 剧烈的微区搅拌提高了极限扩散电流。这些变化都加快了电沉积速度, 使高速局部电镀有可能实现。
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关 键 词: | 铜 电沉积 激光辐照 电极反应 |
A study of laser-enhanced electrodeposition process of copper |
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Abstract: | An electrodeposition process of copper under a laser beam was studied by using a rotating disk electrode. A laser beam results in local temperature rise at the electrode-soln. interface, this leads to: local pos. shift of rest potential, increase in exchange current i0 and charge transfer coefficient a, and strong microstirring which raises the limiting c.d. All these changes enhance electrodeposition rates, thus high-speed selective electroplating can be reached. |
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Keywords: | COPPER ELECTRO-DEPOSITION LASER RADIATION ELECTRODE REACTION |
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