首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Contact resistance in metal-molecule-metal junctions based on aliphatic SAMs: effects of surface linker and metal work function
Authors:Beebe Jeremy M  Engelkes Vincent B  Miller Larry L  Frisbie C Daniel
Institution:Department of Chemistry, University of Minnesota, Minneapolis, Minnesota 55455, USA.
Abstract:Using conducting probe atomic force microscopy (CP-AFM), we have formed molecular tunnel junctions consisting of alkanethiols and alkane isonitrile self-assembled monolayers sandwiched between gold, platinum, silver, and palladium contacts. We have measured the resistance of these junctions at low bias (dV/dI |V=0) as a function of alkane chain length. Extrapolation to zero chain length gives the contact resistance, R0 . R0 is strongly dependent on the type of metal used for the contacts and decreases with increasing metal work function; that is, R0,Ag > R0,Au > R0,Pd > R0,Pt. R0 is approximately 10% smaller for Au junctions with isonitrile versus thiol surface linkers. We conclude that the Fermi level of the junction lies much closer to the HOMO than to the LUMO.
Keywords:
本文献已被 PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号