Two-dimensional magnetoplasmon in the silicon inversion layer |
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Authors: | TN Theis JP Kotthaus PJ Stiles |
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Institution: | Physik-Department E 16, Technische Universität München, 8046 Garching, Federal Republic of Germany |
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Abstract: | The influence of a magnetic field on the behavior of the two-dimensional plasmon is studied in the n-inversion layer of p-type silicon at fixed wavevector as a function of electron density and magnetic field. Most of the behavior is well described by a dispersion relation and lineshape based on a classical theory of the electron gas. However, deviations from the theory are observed which may indicate an interaction with other modes of the system. |
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