The effect of different gas atmospheres on the structure,morphology and photoluminescence properties of pulsed laser deposited Y3(Al,Ga)5O12:Ce3+ nano thin films |
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| Affiliation: | 1. Lavrentyev Institute of Hydrodynamics SB RAS, Lavrentyev Ave. 15, Novosibirsk 630090, Russia;2. Novosibirsk State University, Pirogova str. 2, Novosibirsk 630090, Russia;3. Institute of Solid State Chemistry and Mechanochemistry SB RAS, Kutateladze str. 18, Novosibirsk 630128, Russia;1. University of Pristina, Faculty of Technical Sciences, Kneza Milosa 7, 38220, Kosovska Mitrovica, Serbia;2. University of Belgrade, Faculty of Physics, P.O. Box 368, 11001, Belgrade, Serbia;3. University College of Civil Engineering and Geodesy, Hajduk Stankova 2, 11050, Belgrade, Serbia;1. Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580, Japan;2. Electronics-Inspired Interdisciplinary Research Institute (EIIRIS), Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580, Japan;1. Department of Physics, University of Ottawa, Ottawa, Canada;2. Department of Theoretical Physics, Wroclaw University of Science and Technology, Wroclaw, Poland;1. Prof. C. N. R. Rao Centre for Advanced Materials Research, Tumkur University, Tumkur 572 103, India;2. B.S. Narayan Centre of Excellence for Advanced Materials, B. M. S. Institute of Technology, Yelahanka, Bangalore 560 064, India,;3. Department of Mechanical Engineering, B. M. S. Institute of Technology, Yelahanka, Bangalore 560 064, India;4. Department of Chemistry, M. S. Ramaiah Institute of Technology, Bangalore 560 054, India;5. National Aerospace Laboratories (CSIR), Bangalore 560 017, India |
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| Abstract: | Luminescent properties of Y3(Al,Ga)5O12:Ce3+ phosphor powder and thin films were obtained. The phosphor powder was used as target material for Pulsed Laser Deposition (PLD) of the thin films in the presence of different background gases. Excitation peaks for the powder were obtained at 439, 349, 225 and 189 nm and emission peaks at 512 and 565 nm. X-ray diffraction indicated that better crystallization took place for films deposited in a 20 mTorr O2 atmosphere. Atomic force microscope revealed an RMS value of 0.7 nm, 2.5 nm and 4.8 nm for the films deposited in vacuum, O2 and Ar atmospheres, respectively. The highest PL intensity was observed for films deposited in the O2 atmosphere. A slight shift in the wavelength of the PL spectra was obtained for the thin films due to a change in the crystal field. The thickness of the films varied from 120 nm to 270 nm with films deposited in vacuum having the thin layer and those in Ar having the thick layer. The stoichiometry of the powder was maintained in the film during the deposition as confirmed by Rutherford backscattering spectroscopy. |
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| Keywords: | Pulsed laser deposition Different gas atmospheres |
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