| 氩氧控制气氛下直流电弧放电中氟化反应 |
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| 引用本文： | 胡斌 江祖成. 氩氧控制气氛下直流电弧放电中氟化反应[J]. 高等学校化学学报, 1990, 11(10): 1129-1131 |
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| 作者姓名： | 胡斌 江祖成 |
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| 作者单位： | 武汉大学化学系(胡斌，江祖成，廖振环)，武汉大学化学系(曾云鹗) |
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| 摘 要： | 本文以前文为基础测定了不同氟化剂存在下杂质元素的蒸发率,计算了弧温、电子密度以及杂质元素的电离度,研究了影响元素谱线强度的诸因素,用晶体X射线衍射分析了电极反应残留物,提出了氟化反应的机理,并通过热力学计算予以说明。 1实验部分 1.1 仪器及主要工作条件 HILGER WATTS大型棱镜摄谱仪,直流电弧光源,电流10
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| 关 键 词： | 氟化反应 直流电弧放电 控制气氛 |
Fluorination Reaction Under Ar-O2 Controlled Atmosphere DC Arc Discharge |
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| Hu Bin,Jiang Zucheng,Liao Zhenhuan,Zeng Yun''''e. Fluorination Reaction Under Ar-O2 Controlled Atmosphere DC Arc Discharge[J]. Chemical Research In Chinese Universities, 1990, 11(10): 1129-1131 |
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| Authors: | Hu Bin Jiang Zucheng Liao Zhenhuan Zeng Yun''''e |
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| Abstract: | Evaporization rate of impurity elements was determined in the presence of different fluorat-ing agents. Arc temperature, electron pressure, ionization degree of impurity elements were calculated. On the basis of these data, all kinds of factors influencing the element spectral intensity are discussed. Reaction products in the electrode cavity were analysed with X-ray diffraction. Under these conditions the mechanism of the fluorination reaction is proposed, and demonstrated by thermodynami-cal calculation. |
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| Keywords: | Direct current arc discharge Controlled atmosphere Fluorination reaction |
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