| 磁控溅射法中影响薄膜生长的因素及作用机理研究 |
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| 引用本文： | 郝正同,谢泉,杨子义.磁控溅射法中影响薄膜生长的因素及作用机理研究[J].贵州大学学报(自然科学版),2010,27(1):62-66. |
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| 作者姓名： | 郝正同 谢泉 杨子义 |
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| 作者单位： | 1. 贵州大学理学院,贵州大学新型光电子材料与技术研究所,贵阳,550025;绵阳师范学院物理与电子工程学院,绵阳,621000
2. 贵州大学理学院,贵州大学新型光电子材料与技术研究所,贵阳,550025 |
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| 基金项目： | 国家自然科学基金(60566001,60766002);;科技部国际合作重点项目(2008DFA52210);;贵州省信息产业厅项目(0831);;贵阳市科技计划项目(2009筑科大合同字第6号) |
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| 摘 要： | 磁控溅射法是制备薄膜材料的重要手段,薄膜属性受其制备参数的制约,诸参数相互关联,共同影响薄膜的沉积、成核及生长。本文在简要介绍了磁控溅射制备薄膜的基本原理及基本流程的基础上,讨论了溅射参数影响薄膜属性的基本规律和作用机理,并简述了使用磁控溅射法制备薄膜的注意事项。
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| 关 键 词： | 磁控溅射 溅射参数 薄膜制备 退火处理 薄膜属性 |
Influences of Sputtering Parameters on Performance of Thin Film |
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| HAO Zheng-tong,XIE Quan,YANG Zhi-yi.Influences of Sputtering Parameters on Performance of Thin Film[J].Journal of Guizhou University(Natural Science),2010,27(1):62-66. |
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| Authors: | HAO Zheng-tong XIE Quan YANG Zhi-yi |
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| Institution: | 1.Institute of Advanced Optoelectronic Materials and Technology;College of Science;Guizhou University;Guiyang 550025;China;2.School of Physics and Electronics Engineering;Mianyang Normal University;Mianyang;621000;China |
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| Abstract: | Magnetron sputtering is an important method for the fabrication of thin film.The physical and chemical properties of thin film are controlled by sputtering parameters,so it is essential to know the relationship between these properties and the sputtering parameters.In this paper,the basic theory of the sputtering magnetron was described,after which the relationship between properties of film and the sputtering parameters was discussed in detail,and then the concise reviews about flow of fabrication were pre... |
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| Keywords: | magnetron sputtering sputtering parameters fabrication of thin film annealing properties of thin film |
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