Intercalation of two-dimensional graphite films on metals by atoms and molecules

An analysis is made of some general laws governing a new physical effect, i.e., the spontaneous penetration of particles (atoms, C₆₀ molecules) adsorbed on a two-dimensional graphite film on a metal (Ir, Re, Pt, Mo,...) to beneath the graphite film (intercalation). It is shown that atoms having low ionization potentials (Cs, K, Na) intercalate a two-dimensional graphite film on iridium at T=300–400K with an efficiency χ≈0.5, accumulating beneath the film to a concentration of up to a monolayer. Atoms having high ionization potentials (Si, Pt, Ni, C, Mo, etc.) intercalate a two-dimensional graphite film on iridium at T≈1000K with an efficiency, χ≈1, forming beneath the film a thick intercalate layer which is strongly bonded chemically to the metal substrate but is probably weakly bonded to the graphite monolayer by van der Waals forces. The presence of a graphite “lid” impeding the escape of atoms from the intercalated state up to record high temperatures T∼2000K leads to superefficient diffusion (with an efficiency close to one) of various atoms (Cs, K) into the bulk of the substrate (Re, Ir). Zh. Tekh. Fiz. 69, 72–75 (September 1999)