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GaN nucleation on (0 0 0 1)-sapphire via ion-induced nitridation of gallium
Authors:A. Sidorenko  H. Neumann
Affiliation:a Universität Tübingen, Institut für Physikalische und Theoretische Chemie, Auf der Morgenstelle 8, D-72076 Tübingen, Germany
b Leibniz-Institut für Oberflächenmodifizierung e.V. Permoserstr. 15, D-04318 Leipzig, Germany
Abstract:The growth of epitaxial GaN films on (0 0 0 1)-sapphire has been investigated using X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED). In order to investigate the mechanism of the growth in detail, we have focused on the nitridation of pre-deposited Ga layers (droplets) using ion beam-assisted molecular beam epitaxy (IBA-MBE). Comparative analysis of XPS core-level spectra and LEED patterns reveals, that nitride films nucleate as epitaxial GaN islands. The wetting of the surface by GaN proceeds via reactive spreading of metallic Ga, supplied from the droplets. The discussed growth model confirms, that excess of metallic Ga is beneficial for GaN nucleation.
Keywords:81.05.Ea   82.80.Pv   61.14.Hg
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