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ToF-SIMS analysis of a fluorocarbon-grafted PET with a gold cluster ion source
Authors:Zhengmao Zhu  Michael J Kelley
Institution:a Department of Applied Science, College of William and Mary, Applied Research Center-601, 12050 Jefferson Aveneue, Newport News, VA 23606, United States
b Free Electron Laser Department, Thomas Jefferson National Accelerator Facility, MS 6A, 12000 Jefferson Avenue, Newport News, VA 23606, United States
Abstract:Cluster ions have been recognized as a superb primary species in time of flight secondary ion mass spectroscopy (ToF-SIMS) compared with monatomic primary ions, as they significantly enhance the secondary ion yields from bulk samples. Self-assembled monolayers provide an important system for studying the fundamental mechanism involved in the yield enhancement.We used a gold cluster ion source to analyze a new type of self-assembled monolayer: a fluorocarbon-grafted polyethylene terephthalate. In addition to the structure details, which helped to understand the grafting mechanism, ToF-SIMS analysis revealed that fluorocarbon secondary ion yield enhancements by cluster ions were due to the enhanced sputter efficiency. A larger information depth may also be expected from the enhancement. Both mathematical definitions of damage cross-section and disappearance cross-section were revisited under a new context. Another cross-section parameter, sputter cross-section, was introduced to differentiate the beam induced sputter process from damage process.
Keywords:SIMS  Cluster ion  Polymer  Monolayer  Surface analysis  Sputter cross-section
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