The ultimate in real-time ellipsometry: Multichannel Mueller matrix spectroscopy |
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Authors: | Chi Chen Sean Pursel RW Collins |
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Institution: | a The University of Toledo, 2801 West Bancroft Street, Department of Physics and Astronomy, Mail Stop 111, Toledo, OH 43606-3390, USA b Institute of Photovoltaics, Forschungszentrum Jülich GmbH, Jülich 52425, Germany c The Pennsylvania State University, Department of Engineering Science and Mechanics, Materials Research Institute, University Park, PA 16802, USA |
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Abstract: | A review of the techniques and applications of multichannel ellipsometry in the dual-rotating-compensator configuration is given. This ellipsometric approach has been established as the ultimate in real-time, single-spot optical measurement, as it determines the entire 16-element Mueller matrix of a sample over a wide spectral range (up to 1.7-5.3 eV) from raw data collected over a single optical period of 0.25 s. The sequence of optical elements for this ellipsometer is denoted PC1rSC2rA, where P, S, and A represent the polarizer, sample, and analyzer. C1r and C2r represent two MgF2 rotating compensators, either biplates or monoplates that rotate synchronously at frequencies of ω1 = 5ω and ω2 = 3ω, where π/ω is the fundamental optical period. Previous high-speed Mueller matrix measurements with this instrument have been performed on uniform, weakly anisotropic samples such as (110) Si, in which case one can extract the bulk isotropic and near-surface anisotropic optical responses simultaneously. In such an application, the instrument is operated at its precision/accuracy limits. Here, ex situ results on a strongly anisotropic, locally biaxial film are presented that demonstrate instrument capabilities for real-time analysis of such films during fabrication or modification. In addition, the use of the instrument as a real-time probe to extract surface roughness evolution on three different in-plane scales for an isotropic film surface is demonstrated for the first time. |
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Keywords: | 07 60 Fs (polarimeters and ellipsometers) 78 20 Ci (optical constants [including refractive index complex dielectric constant absorption reflection and transmission coefficients emissivity]) 78 20 Ek (optical activity) 68 35 Ct (interface structure and roughness) |
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