The morphology of a thin film was studied for a binary mixture of asymmetric PS‐b‐PMMA block copolymers on a flat silicon wafer coated with 50 nm thick silicon oxide. AFM and TEM reveal that the PMMA cylinders orient perpendicular to the substrate by tuning the film thickness. Furthermore, grating substrates with different width and depth are used to guide the alignment of the perpendicular cylinders. As a result, an array of highly ordered, hexagonally packed PMMA cylinders in the PS matrix with a domain spacing of less than 25 nm has been produced.
