首页 | 本学科首页   官方微博 | 高级检索  
     


A super-junction SOI-LDMOS with low resistance electron channel
Affiliation:1.College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing 400065, China;2.Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;3.University of Chinese Academy of Sciences, Beijing 100049, China
Abstract:A novel super-junction LDMOS with low resistance channel (LRC), named LRC-LDMOS based on the silicon-on-insulator (SOI) technology is proposed. The LRC is highly doped on the surface of the drift region, which can significantly reduce the specific on resistance (Ron,sp) in forward conduction. The charge compensation between the LRC, N-pillar, and P-pillar of the super-junction are adjusted to satisfy the charge balance, which can completely deplete the whole drift, thus the breakdown voltage (BV) is enhanced in reverse blocking. The three-dimensional (3D) simulation results show that the BV and Ron,sp of the device can reach 253 V and 15.5 mΩ·cm2, respectively, and the Baliga's figure of merit (FOM=BV2/Ron,sp) of 4.1 MW/cm2 is achieved, breaking through the silicon limit.
Keywords:LDMOS  breakdown voltage (BV)  specific on resistance (Ron  sp)  figure of merit (FOM)  
本文献已被 CNKI 等数据库收录!
点击此处可从《中国物理 B》浏览原始摘要信息
点击此处可从《中国物理 B》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号