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| DEPOSITION OF DIAMOND FILMS BY PCVD FROM METHANE-HYDROGEN | |
| 摘 要： | Diamond thin films have been formed by plasma chemical vapordeposition from methane(CH_4)and hydrogen(H_2)mixed gases on silicon andquartz substrates.The films deposited under suitable conditions have goodcrystallity measured by SEM,X-ray diffraction and Raman spectra.The con-centration of methane is one of important parameters in depositing diamondfilms.The deposition rate is given. |
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