Properties of a Thin-Film Optical Waveguide Using Fluorinated Silicon Oxide and Organic Spin-on-Glass Films

A thin-film optical waveguide using a fluorinated silicon oxide (SiOF) as a core layer was investigated. An organic spin-on-glass (SOG) film was used for a cladding layer. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H₂SiF₆) aqueous solution. A thin-film optical waveguide structure for single mode was designed and fabricated, based on the dispersion properties of refractive indices for the LPD-SiOF and organic SOG films. The refractive indices at a wavelength of 632.8 nm were 1.430 and around 1.400 for the LPD-SiOF and organic SOG films, respectively. The thickness of LPD-SiOF films deposited was 1.18 μm. Thicknesses of cladding organic SOG films cured at 300 and 400°C were 1.28 and 1.31μm, respectively. The effective refractive indices for single mode were 1.4169 and 1.4158 at a wavelength of 632.8 nm for the cladding organic SOG films cured at 300 and 400°C, respectively, and differences between the measured and calculated incident angles were 0.84° and 1.29° for the cladding organic SOG films cured at these respective temperatures. A streak of guided-light was observed for the LPD-SiOF/SOG structure optical waveguide. The transmission loss was 7.6-7.9 dB/cm.