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An improved method for chemical bath deposition of ZnS thin films
Authors:Fei Long  Wei-Min Wang  Zhan-kui Cui  Li-Zhen Fan  Zheng-guang Zou  Tie-kun Jia
Institution:aState Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China;bKey Laboratory of New Processing Technology for Nonferrous Metals and Materials, Ministry of Education, Guilin University of Technology, Guilin 541004, China;cSchool of Materials Science and Engineering, University of Science and Technology Beijing, 100083 Beijing, China
Abstract:ZnS thin films were prepared by an improved chemical bath deposition method, which the substrates were preheated before being mounted in the reaction solution. X-ray diffraction (XRD) and energy dispersive spectrometer (EDS) reveals that thin film ZnS has a cubic structure and the typical composition ratio of Zn/S is 52:48. Scanning electron microscopy (SEM) characterization shows that the surface of the sample is compact and uniform. The transmission spectrum indicates a good transmission characteristic with an average transmittance of 82.2% in the spectra range from 350 nm to 800 nm and the optical band gap is about 3.76 eV.
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