Carrier concentration in modulation-doped AlGaAs-GaAs heterostructures

Single-interface modulation-doped AlGaAs-GaAs heterostructures have very high mobilities if thick undoped spacers are introduced between the Si donors and the twodimensional electron gas. Electron densities are limited to values below 10¹² cm^–2. Higher channel densities are desirable for device applications and can be obtained by confining the electrons in quantum wells doped from both sides. Single quantum-well structures have been grown with sheet carrier densities exceeding 3×10¹² cm^–2 at 300 K and 77 K mobilities of 54,000 cm²/Vs. Single quantum wells doped from one side only with low electron concentrations of 2×10¹¹ cm^–2 have 4.2 K mobilities of 200,000cm²/Vs.