Block copolymer adsorption from a homopolymer melt to an amine-terminated surface |
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| Authors: | A?C?Costa R?J?Composto P?Vl?ek Email author" target="_blank">M?GeogheganEmail author |
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| Institution: | (1) Department of Materials Science and Engineering, Laboratory for Research on the Structure of Matter, University of Pennsylvania, PA 19104-6272 Philadelphia, USA;(2) Institute of Macromolecular Chemistry, Academy of Sciences of the Czech Republic, Heyrovského námestı 2, 162 06 Prague 6, Czech Republic;(3) Department of Physics and Astronomy, University of Sheffield, Hicks Building, Hounsfield Road, S3 7RH Sheffield, United Kingdom |
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| Abstract: | Using neutron reflectometry, the adsorption of diblock copolymers from a neutral polystyrene (PS) matrix is studied as a function
of substrate type and non-adsorbing block degree of polymerization. The block copolymer is poly(deutero styrene)-block-poly(methyl methacrylate) and the substrates are silicon oxide, SiOx, and SiOx functionalized with (3-aminopropyl)triethoxysilane (APTES). We have determined the equilibrium volume fraction-depth profiles
for such films, and compared them with volume fraction profiles generated by self-consistent mean-field (SCMF) theory and
find good agreement between the experimental and theoretical data. SCMF calculations show that the segmental interaction energy
between PS matrix chains and APTES is two orders of magnitude stronger than that between PS and SiOx. |
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| Keywords: | 68 08 De Structure measurements and simulations 61 12 Ha Neutron reflectometry 83 80 Uv Block copolymers |
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