Oriented polycrystalline α-HgI2 thick films grown by physical vapor deposition

This work investigates the growth of polycrystalline α-HgI₂ thick films from physical vapor deposition. By varying the growth conditions, the as-deposited thick films are characterized by scanning electron microscopy, X-ray diffraction, current–voltage and photoconductivity measurements. The growth mechanism and its effects to the properties of these polycrystalline α-HgI₂ thick films are then discussed. Finally, the best deposition conditions for polycrystalline α-HgI₂ thick films compactly formed by separated columnar monocrystallines with uniform orientation along c-direction and with good crystallinity are reported.