α-P/GaAs(100)界面的光电子能谱研究

本文采用X射线光电子能谱、紫外光电子能谱和低能电子衍射对室温下P在GaAs(100)表面上的生长进行了研究。结果表明,在生长初期P是成团吸附的,随着淀积量的增加而生长成α-P薄膜,该薄膜的价带结构与等离子体淀积的α-P:H薄膜的价带结构相似。在界面处有约一单层的P与衬底表面的Ga成键。α-P覆盖层使GaAs表面势垒下降约0.2eV。关键词：

PHOTOELECTRON SPECTROSCOPY STUDIES OF α-P/GaAs (100) INTERFACES

The room temperature deposited α-P/GaAs(100) interfaces have been studied by XPS, UPS, and LEED. The results show that P is adsorbed as clusters on the surface of GaAs at the initial stage of the interface formation, α-P film is formed as the deposition amount is further increased. The valence structures of the films so obtained are similar to those of plasma deposited α-P:H films. There are about one monolayer of P atoms bonded to Ga atoms of the substrate at the interface, α-P overlayer results in 0.2 eV lowering of GaAs surface barrier.