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SIMS as a subnanometer probe: A new tool for chemical profile analysis of grafted molecules
Authors:Fré    ric Ché  rioux,Bernard Gauthier-Manuel,Thierry Grenut
Affiliation:a Laboratoire FEMTO-ST/LPMO, UMR CNRS 6174 Université de Franche-Comté, 32 Avenue de l’Observatoire, F-25044 Besançon, France
b Millbrook Instruments Ltd., Blackburn Technology Centre, Challenge Way, Blackburn, Lancashire BB1 5QB, United Kingdom
c Elexience, 9 rue des Petits Ruisseaux, BP 91, F-91371 Verrières-le-Buisson Cedex, France
Abstract:The complexity of modern engineered surfaces requires the development of very powerful methods to analyze and characterize them. We demonstrate that it is possible to obtain chemical information about the skeleton of organic molecules constituting SAMs grafted on a silicon surface by using a new type of SIMS method. A profile can be achieved by the investigation of the temporal variation of secondary ion intensities that correspond to the fractional parts of the molecule constituting the SAMs. The equivalent ablation rate is less than 0.5 nm/min.
Keywords:SIMS   Depth profiling   SAMs   Sputtering   Submolecular
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