RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR |
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Authors: | Halil Turgut Sahin |
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Institution: | Suleyman Demirel University, Faculty of Forestry, Department of Forest Products Engineering, 32260 Isparta, Turkey |
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Abstract: | The study was performed to examine the correlation between the initial roughness and surface fluorination of paper under RF-CF4 plasma environment.Based on the experimental observations, a correlation was observed between surface fluorination and plasma parameters, e.g. RF-power, treatment time and gas pressure. The level of fluorination with RF-CF4 plasma treatment was found to be extensive in both side of paper. Even very short treatment time, as low as 1 min at 300 W power, provides effective implantation of fluorine (38.7%) on surfaces. It was observed that, CF4 plasma treatment had a significant effect on the molecular fragmentation on both side of paper. However, the felt side have a much stronger effect on plasma-induced dissociation and fluorination than in the wire side of paper. |
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Keywords: | 81 15 Fg 52 38 Ph 52 77 Bn 52 40 Hx 82 33 Xj |
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